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Nano, Technology, Semiconductor Expert #31081

I have 20 years of experience, and specialize in the field of plasma etch in semiconductor with specific knowledge in the areas of oxide etch, new process development and process characterization. I have published on such topics as relativistic correction to semiconductor properties, large size SAC process development, and dual damascene process development. I have experience in project management, process development, and industrial and research experience. I have been trained in various aspects of semiconductor physics; especially in dry etch process development

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